Automated Chemical Vapor Deposition (CVD) ensures consistent and repeatable growth conditions. The system has been designed around functionality for the user, ease of portability and general maintenance and troubleshooting.

This system is automated for growth of nanotubes, surface oxidation, annealling or misc. high temperature processes. The graphic user interface (GUI) provides simple control of the process.

Computer interfacing and automation programming via National Instruments DAQ and Visual Basic.

Explanation of images:

(top) Homebuilt CVD, consisting of 3 mass flow controllers, pressure sensor, and thermocouple temperature measurements.

(bottom left) SEM images of nanotube generation, at varying resolution.

(bottom right) GUI for full computer control of CVD system.